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	Confined etchant layer technique (CELT) for micromanufacture
	Zhan, Dongpi ; Han, Lianhua ; Yang, Dez ; Jiang, Li- ; Tang, Ji ; Sun, Jian-Ju ; Shi, Kan ; Zhou, Jianzha ; Tian, Zhong-Q ; Tian, Zhao- ; Zhan DP(詹东平) ; Tang J(汤儆) ; Shi K(时康) ; Zhou JZ(周剑章) ; Tian ZQ(田中群) ; Tian ZW(田昭武)
	2011
英文摘要	Conference Name:6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011. Conference Address: Kaohsiung, Taiwan. Time:February 20, 2011 - February 23, 2011.; Institute of Electrical and Electronics Engineers (IEEE); IEEE Nanotechnology Council (NTC); National Cheng Kung University; National Tsing Hua University; Chinese International NEMS Socity (CINS); Confined etchant layer technique (CELT) is an electro-and/ or photo- chemically induced chemical etching method for micromanufacture originated by our research group, which is distinguished from the LIGA and EFAB. To obtain the micro-/nano- meter precision, there are three strategies of CELT: (1) electro- and/or photo- chemical generation of etchant on the surface of tool; (2) confining the etchant layer to a thickness of micro-/nano- meter; (3) Approaching tool to the workpiece for micromanufacturing. CELT have been proved successful in the micromanufacture on conductive, semiconductive and also insulate workpiece. In this paper, our work on CELT will be reviewed and future research will also be prospected. ? 2011 IEEE.
语种	英语
出处	http://dx.doi.org/10.1109/NEMS.2011.6017490
出版者	IEEE Computer Society
内容类型	其他
源URL	[http://dspace.xmu.edu.cn/handle/2288/85440]
专题	化学化工－会议论文
推荐引用方式 GB/T 7714	Zhan, Dongpi,Han, Lianhua,Yang, Dez,et al. Confined etchant layer technique (CELT) for micromanufacture. 2011-01-01.

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