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Selective amorphization and novel coaxial structure formation of a single crystal Si nanowire induced by focused electron beam irradiation
Li, Feng ; Su, Jiang-Bin ; Li, Lun-Xiong ; Li LX(李论雄)
刊名http://dx.doi.org/10.3969/j.issn.1001-9731.2014.03.018
2014
关键词Amorphization Electron beams Irradiation Nanowires Silicon Single crystals Transmission electron microscopy
英文摘要Structural instability of a single crystal Si nanowire at room temperature under focused electron beam irradiation was investigated by our developed in-situ transmission electron microscopy observation technique. It was observed that a series of intriguing changes such as preferential amorphization at the surface of Si nanowire, local bulging in the radial direction and formation of a novel three layers-packaged coaxial structure of Si nanowire with the increasing of electron doses during the irradiation. The possible mechanism for such phenomena was proposed and further discussed by completely new concepts of nanocurvature effect and energetic beam-induced athermal activation effect, while the current knock-on mechanism and electron beam heating effect seemed inadequate to explain these processes.
语种英语
出版者Journal of Functional Materials
内容类型期刊论文
源URL[http://dspace.xmu.edu.cn/handle/2288/89735]  
专题化学化工-已发表论文
推荐引用方式
GB/T 7714
Li, Feng,Su, Jiang-Bin,Li, Lun-Xiong,et al. Selective amorphization and novel coaxial structure formation of a single crystal Si nanowire induced by focused electron beam irradiation[J]. http://dx.doi.org/10.3969/j.issn.1001-9731.2014.03.018,2014.
APA Li, Feng,Su, Jiang-Bin,Li, Lun-Xiong,&李论雄.(2014).Selective amorphization and novel coaxial structure formation of a single crystal Si nanowire induced by focused electron beam irradiation.http://dx.doi.org/10.3969/j.issn.1001-9731.2014.03.018.
MLA Li, Feng,et al."Selective amorphization and novel coaxial structure formation of a single crystal Si nanowire induced by focused electron beam irradiation".http://dx.doi.org/10.3969/j.issn.1001-9731.2014.03.018 (2014).
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