Dynamic investigation of the finite dissolution of silicon particles in aluminum melt with a lower dissolution limit | |
Dong XX(董曦曦) ; He LJ(何良菊) ; Mi GB(弭光宝) ; Li PJ(李培杰) ; Dong Xi-Xi ; He Liang-Ju ; Mi Guang-Bao ; Li Pei-Jie | |
2016-03-30 ; 2016-03-30 | |
关键词 | silicon particle aluminum melt lower dissolution limit finite dissolution model TQ133.1 |
其他题名 | Dynamic investigation of the finite dissolution of silicon particles in aluminum melt with a lower dissolution limit |
中文摘要 | The finite dissolution model of silicon particles in the aluminum melt is built and calculated by the finite difference method, and the lower dissolution limit of silicon particles in the aluminum melt is proposed and verified by experiments,which could be the origin of microinhomogeneity in aluminum–silicon melts. When the effects of curvature and interface reaction on dissolution are not considered; the dissolution rate first decreases and later increases with time. When the effects of curvature and interface reaction on dissolution are considered, the dissolution rate first decreases and later increases when the interface reaction coefficient(k) is larger than 10-1, and the dissolution rate first decreases and later tends to be constant when k is smaller than 10-3. The dissolution is controlled by both diffusion and interface reaction when k is larger than10-3, while the dissolution is controlled only by the interface reaction when k is smaller than 10-4.; The finite dissolution model of silicon particles in the aluminum melt is built and calculated by the finite difference method, and the lower dissolution limit of silicon particles in the aluminum melt is proposed and verified by experiments,which could be the origin of microinhomogeneity in aluminum–silicon melts. When the effects of curvature and interface reaction on dissolution are not considered; the dissolution rate first decreases and later increases with time. When the effects of curvature and interface reaction on dissolution are considered, the dissolution rate first decreases and later increases when the interface reaction coefficient(k) is larger than 10-1, and the dissolution rate first decreases and later tends to be constant when k is smaller than 10-3. The dissolution is controlled by both diffusion and interface reaction when k is larger than10-3, while the dissolution is controlled only by the interface reaction when k is smaller than 10-4. |
语种 | 英语 ; 英语 |
内容类型 | 期刊论文 |
源URL | [http://ir.lib.tsinghua.edu.cn/ir/item.do?handle=123456789/141723] |
专题 | 清华大学 |
推荐引用方式 GB/T 7714 | Dong XX,He LJ,Mi GB,et al. Dynamic investigation of the finite dissolution of silicon particles in aluminum melt with a lower dissolution limit[J],2016, 2016. |
APA | 董曦曦.,何良菊.,弭光宝.,李培杰.,Dong Xi-Xi.,...&Li Pei-Jie.(2016).Dynamic investigation of the finite dissolution of silicon particles in aluminum melt with a lower dissolution limit.. |
MLA | 董曦曦,et al."Dynamic investigation of the finite dissolution of silicon particles in aluminum melt with a lower dissolution limit".(2016). |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论