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	非晶硒合金膜的制备方法研究
	孔玮曼 ; 张斌 ; 温婷婷 ; KONG Wei-man ; ZHANG Bin ; WEN Ting-ting
	2010-06-04 ; 2010-06-04
关键词	半导体技术 非晶硒 X射线平板探测仪 热蒸镀 semiconductor technology amorphous selenium X-ray flat panel detector thermal evaporation deposition TN204
其他题名	Study on Preparation Method of a-Se Alloy Film
中文摘要	基于传统工艺,新研制开发了一套非晶硒合金膜制备的设备和工艺流程。实验采用高真空电阻加热蒸镀方法,已制备出面积为180mm×180mm的非晶硒合金膜并进行了基本特性检测。测试结果表明:所制备的膜非晶化程度高,厚度最大为90μm,厚度分布比较均匀,相对误差在10%以内。所制备的膜满足光电转换膜的基本特性要求。; A new set of facilities and work flow for preparing amorphous selenium alloy films had been developed out based on traditional techniques. High vacuum resistance heating evaporation method is taken, amorphous selenium alloy films with 180 mm×180 mm in area had been worked out and fundamental parameters had been detected. The test results show that the amorphous selenium alloy film prepared by the experiment is high amorphous, thickness maximum of the film is 90 μm and thickness distribution is close to uniform which the relative error of thickness distribution is below 10 percent. The film prepared is satisfied with the basic requirement of photoelectric conversion film.
语种	中文 ; 中文
内容类型	期刊论文
源URL	[http://hdl.handle.net/123456789/36153]
专题	清华大学
推荐引用方式 GB/T 7714	孔玮曼,张斌,温婷婷,等. 非晶硒合金膜的制备方法研究[J],2010, 2010.
APA	孔玮曼,张斌,温婷婷,KONG Wei-man,ZHANG Bin,&WEN Ting-ting.(2010).非晶硒合金膜的制备方法研究..
MLA	孔玮曼,et al."非晶硒合金膜的制备方法研究".(2010).

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