QQ客服 官方微博 反馈留言

	A novel ellipsometer for measuring thickness of oxide layer on the surface of silicon sphere
	Jitao Zhang ; Yan Li
	2010-05-10 ; 2010-05-10
会议名称	Proceedings of the SPIE - The International Society for Optical Engineering ; Optical Design and Testing III ; Beijing, China ; INSPEC
关键词	Practical Experimental/ constants diameter measurement ellipsometry refractive index measurement silicon thickness measurement/ ellipsometer oxide layer thickness measurement single crystal silicon sphere surface Avogadro constant NA oxide layer refractive index diameter measurement high relative uncertainty Si/ A0760F Optical polarimetry and ellipsometry A0760H Optical refractometry and reflectometry A0630C Spatial variables measurement A0620J Determination of fundamental constants B7320P Optical variables measurement B7320C Spatial variables measurement B7140 Determination and value of fundamental constants/ Si/sur Si/el
中文摘要	The Avogadro constant NA is used as one of the several possible routes to redefinition of the kilogram in metrology today. Usually in order to accurately determine NA, the volume of a perfect single crystal silicon sphere of nearly 1 kg mass should be measured with a high relative uncertainty, i.e. about 1*10/sup -8/. However, the oxide layer grown on the surface of the silicon sphere causes a remarkable systematic difference between the measured and real diameters. A novel ellipsometer has been developed to determine the thickness of the oxide layer accurately and automatically. The arrangement of this instrument is suitable for measuring the layer on the sphere surface. What's more, the measuring is faster by optimizing the parameters and developing the algorithm of calculating the thickness and refractive index of the oxide layer. The preliminary simulation result has present. Thus, the uncertainty of the diameter measurement caused by the oxide layer can be observably reduced. And the further improving of this ellipsometer is discussed in the end.
会议录出版者	SPIE - The International Society for Optical Engineering ; USA
语种	英语 ; 英语
内容类型	会议论文
源URL	[http://hdl.handle.net/123456789/19341]
专题	清华大学
推荐引用方式 GB/T 7714	Jitao Zhang,Yan Li. A novel ellipsometer for measuring thickness of oxide layer on the surface of silicon sphere[C]. 见:Proceedings of the SPIE - The International Society for Optical Engineering, Optical Design and Testing III, Beijing, China, INSPEC.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。