Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates

	Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates
	Xu Zhang ; Zhi Liu ; Chao He ; Buwen Cheng ; Chunlai Xue ; Chuanbo Li ; Qiming Wang
刊名	journal of materials science: materials in electronics
	2016
卷号	27 期号:9 页码:9341-9345
学科主题	光电子学
收录类别	SCI
公开日期	2017-03-16
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/27983]
专题	半导体研究所_光电子研究发展中心
推荐引用方式 GB/T 7714	Xu Zhang,Zhi Liu,Chao He,et al. Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates[J]. journal of materials science: materials in electronics,2016,27(9):9341-9345.
APA	Xu Zhang.,Zhi Liu.,Chao He.,Buwen Cheng.,Chunlai Xue.,...&Qiming Wang.(2016).Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates.journal of materials science: materials in electronics,27(9),9341-9345.
MLA	Xu Zhang,et al."Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates".journal of materials science: materials in electronics 27.9(2016):9341-9345.