The steady flying of a plasmonic flying head over a photoresist-coated surface in a near-field photolithography system

	The steady flying of a plasmonic flying head over a photoresist-coated surface in a near-field photolithography system
	Ji, Jiaxin 1; Hu, Yueqiang 1; Meng, Yonggang 1; Zhang, Jun 1; Xu, Jian 2; Li, Shayu 2; Yang, Guoqiang 2
刊名	NANOTECHNOLOGY
	2016-05-06
卷号	27 期号:18
关键词	NFPT plasmonic lens molecular glass photoresist molecular gas lubrication
英文摘要	The near-field photolithography technique (NFPT) offers a new approach of nanolithography for a dramatic increase in the resolution with high throughput and low cost. The NFPT utilizes the same flight principle as that of the magnetic head of hard-disk drives but replacing the magnetic head with a plasmonic flying head. The plasmonic flying head, which can focus the incident laser beam to a spot size of sub-20 nm with an enhanced field intensity by exciting surface plasmon polaritons, takes off and then flies steadily above the revolving disk coated by a photoresist film to be patterned with a narrow gap of tens of nanometers. As a key foundation of the NFPT, the take off and flight stability of the plasmonic flying head affects the pattern density and the fabrication efficiency. This work proposed and investigated a molecular glass photoresist, named FPT-8Boc, for the large-scale consistent fabrication with the NFPT. To overcome the take-off problem of the head over the soft photoresist film, a transition zone is intentionally formed by washing off the coated photoresist in the outer area of the disk using a solvent. The simulation results by COMSOL Multiphysics software and quasi-Newton iteration method review that the matched transition zone height with spreading length can guarantee the flight stability of the plasmonic flying head on the soft photoresist. Using this method, a preliminary photolithography result with a 31 nm line width has been achieved.
收录类别	SCI
语种	英语
内容类型	期刊论文
源URL	[http://ir.iccas.ac.cn/handle/121111/35957]
专题	化学研究所_光化学实验室
作者单位	1.Tsinghua Univ, State Key Lab Tribol, Beijing 100084, Peoples R China 2.Chinese Acad Sci, Inst Chem, CAS Key Lab Photochem, Beijing Natl Lab Mol Sci, Beijing 100190, Peoples R China
推荐引用方式 GB/T 7714	Ji, Jiaxin,Hu, Yueqiang,Meng, Yonggang,et al. The steady flying of a plasmonic flying head over a photoresist-coated surface in a near-field photolithography system[J]. NANOTECHNOLOGY,2016,27(18).
APA	Ji, Jiaxin.,Hu, Yueqiang.,Meng, Yonggang.,Zhang, Jun.,Xu, Jian.,...&Yang, Guoqiang.(2016).The steady flying of a plasmonic flying head over a photoresist-coated surface in a near-field photolithography system.NANOTECHNOLOGY,27(18).
MLA	Ji, Jiaxin,et al."The steady flying of a plasmonic flying head over a photoresist-coated surface in a near-field photolithography system".NANOTECHNOLOGY 27.18(2016).