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题名	多光束激光并行直写光栅装置
作者	曹武刚
学位类别	硕士
答辩日期	2012
授予单位	中国科学院上海光学精密机械研究所
导师	周常河
关键词	多光束，高精度，光栅，激光直写，伺服聚焦
其他题名	Multi-beam laser parallel direct-writing grating device
中文摘要	20世纪以来，由半导体微电子技术引发的微型化革命进入了一个新的时代，这就是“微纳技术”时代。微纳技术依赖于微纳米尺度的功能结构与器件，实现功能和结构纳米化的基础是先进的微纳米加工技术。作为在该领域关键器件的光栅，在许多高新技术领域有着重要的应用，比如说，天文探测，国防军事，工业科研等。国际上发达国家的光栅制作工艺水平发展迅速，且有部分已经产品化，广泛应用于实验研究和工业生产中，但国内的光栅制作技术和工艺水平与国外相差巨大，大多还停留在传统的全息曝光阶段，远不能满足国家高技术领域对大面积光栅的实际需求，急需开展光栅制作技术和工艺的研究。 开发出一个高精度，大尺度的多光束激光并行直写光栅装置，用于刻写各种不同面积和类型的光栅结构，并形成核心技术的自主知识产权，为微纳光学元件加工领域提供一种低成本、高性能的技术手段，这就是本论文的意义所在。设计和搭建多光束激光并行直写光栅装置是本论文的主体。 本论文首先简要介绍了光栅制作技术的发展历程，具体阐述了金属刻划光栅，全息光栅的发展历史；国内外几种激光直写技术的基本原理及主要特点，并对其主要性能和参数进行了说明，为自行开发多光束激光并行直写光栅装置提供参考。 针对采用该系统用来研究大面积，高精度光栅的制造这一需求，对整个系统提出高精度、多功能、实验型平台三方面要求，并以此为基础，设计系统结构，对构成系统的刻写光源光路模块、聚焦伺服模块、样品扫描模块的关键器件进行分析和选择。 在完成刻写系统的结构设计和关键器件选型后，对系统进行集成和优化。系统的整体软硬件控制架构对系统性能、开发难度影响较大，需要首先加以确定。对专用控制器结构和以计算机为核心的仪器结构进行对比分析后发现，计算机为核心的仪器结构开发环境友好、开发周期短、灵活性大，而其时间确定性低、硬件反馈速度低的缺点在刻写速度慢的情况下影响不大，所以最终被采纳。之后，对影响系统性能的自动聚焦控制、刻写激光功率标定及校正、刻写样品检测等几个问题进行了详细讨论，采用这些措施后，系统成为一个功能强大、使用方便的通用型光栅制造平台。 该系统的实际性能是需要用实验来具体检验的。在文章的实验部分，首先对系统的单元功能进行测试及评价，之后在系统上进行了光栅刻写实验。实验结果表明，本系统的性能参数达到了预期设计。
英文摘要	In recent decades, rapid development of the semiconductor industry has resulted in booming development of microelectronic technology, which is named as “Nanometer Era”. Micro and nano technology depends on the functional structures and elements at micro-nano scale and the basement of the realization of functional structures relys on advanced micro-nano fabrication technology. As the key device in the field of Optics, grating has many applications in high-tech areas, such as astronomy, national defence and military, industrial and scientific research. In developed countries, grating manufacturing technology develops quickly and some products have been used in scientific research and industrial production. However, domestic manufacturing technology of grating can’t meet the nation’s high-tech needs of making large area gratings. Therefore, it is necessary to research on the grating fabrication technology. This thesis focuses on the development of a multi-beam direct laser writing (MBDLW) system which can be applied to make diffraction gratings of different size and type. We expect to supply low-cost, high-performance system for Chinese lithography industry. First, the history of the development of grating manufacturing technology is addressed. The basic principles and main features of direct laser writing are briefly explained. The direct laser writing is widely used due to its advantages of low cost, low environmental requirements and high performance. In addition, the main features of several typical Direct Laser Writer structures in China and abroad are discussed. In order to make large area and high-precision grating, the MBDLW system must have three main characters: high-precision, multifunctional and experimental platform. The system is designed with these characters and consists of three modules: writing laser and optical path module, servo focus module and sample scanning module. Upon completion of the design of the MBDLW system, the main task is to integrate and optimize the system. Because the hardware structure and software architecture seriously affect the system performance, the hardware structure should be determined firstly. Compared with conventional instrument structure, the structure based on computer has several advantages, such as friendly development environment, shorter development cycles, and greater flexibility. Long respond time and low hardware feedback speed impact the system slightly when the writing speed is slow. The virtual instrument structure is adopted in the end. Servo focus control and scanning path algorithm, which have great impact on system performance, are discussed in detail. The system becomes a powerful, easy-to-use platform for grating fabrication based on above technologies. In the last part of this thesis, the basic functions of the system are evaluated. Some kinds of gratings fabricated by this system have been displayed in the end. The experimental results show that the system meets the qualification requirements.
语种	中文
内容类型	学位论文
源URL	[http://ir.siom.ac.cn/handle/181231/16704]
专题	上海光学精密机械研究所_学位论文
推荐引用方式 GB/T 7714	曹武刚. 多光束激光并行直写光栅装置[D]. 中国科学院上海光学精密机械研究所. 2012.

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