Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography

	Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography
	Chang, Tongxin 1,2; Du, Binyang 3,4; Huang, Haiying 1,2; He, Tianbai 1,2
刊名	ACS APPLIED MATERIALS & INTERFACES
	2016-08-31
卷号	8 期号:34 页码:22705-22713
关键词	block copolymer self-assembly micro/submicro-nanopattern colloidal lithography metal nanoarray complementary structure
英文摘要	Two kinds of large-area ordered and highly tunable micro/submicro-nanopatterned surfaces in a complementary manner were successfully fabricated by elaborately combining block copolymer self assembly and colloidal lithography. Employing a monolayer of polystyrene (PS) colloidal spheres assembled on top as etching mask, polystyrene-block-poly(4-vinylpyridine) (PS=b-P2VP) or polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) micelle films were patterned into micro/submicro patches by plasma etching, which could be further transferred into micropatterned metal narroarrays by subsequent metal precursor loading and a second plasma etching. On the other hand, micro/submicro-nanopatterns in a complementary manner were generated via preloading a metal precursor in initial micelle films before the assembly of PS colloidal spheres on top. Both kinds of micro/submicro-nanopatterns showed good fidelity at the micro/submicroscale and nanoscale; meanwhile, they could be flexibly tuned by the sample and processing parameters. Significantly, when the PS colloidal sphere size was reduced to 250 nm, a high-resolution submicro-nanostructured surface with 3-5 metal nanoparticles in each. patch or a single-nanoparticle interconnected honeycomb network was achieved. Moreover, by applying gold (Au) nanopartides as anchoring points, micronanopatterned Au arrays can serve as a flexible template to pattern bovine serum albumin (BSA) molecules. This facile and cost-effective approach may provide a novel platform for fabrication of micropatterned nanoarrays tunability and controllability, which are promising in the applications of biological and microelectronic fields.
收录类别	SCI
语种	英语
内容类型	期刊论文
源URL	[http://ir.iccas.ac.cn/handle/121111/35374]
专题	化学研究所_高分子物理与化学实验室
作者单位	1.Chinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100039, Peoples R China 3.Zhejiang Univ, Dept Polymer Sci & Engn, MOE Key Lab Macromol Synth & Functionalizat, Hangzhou 310027, Peoples R China 4.Zhejiang Univ, Dept Chem, Hangzhou 310027, Peoples R China
推荐引用方式 GB/T 7714	Chang, Tongxin,Du, Binyang,Huang, Haiying,et al. Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography[J]. ACS APPLIED MATERIALS & INTERFACES,2016,8(34):22705-22713.
APA	Chang, Tongxin,Du, Binyang,Huang, Haiying,&He, Tianbai.(2016).Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography.ACS APPLIED MATERIALS & INTERFACES,8(34),22705-22713.
MLA	Chang, Tongxin,et al."Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography".ACS APPLIED MATERIALS & INTERFACES 8.34(2016):22705-22713.