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	Design of a projection objective with high numeric aperture and large view field
	Liu, Junbo; Hu, Song; Gao, Hongtao; Zhao, Lixin; Zhu, Xianchang
	2014
会议名称	Proceedings of SPIE: 7TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: DESIGN, MANUFACTURING, AND TESTING OF MICRO- AND NANO-OPTICAL DEVICES AND SYSTEMS
会议日期	2014
卷号	9283
页码	92830L
通讯作者	Liu, JB (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China.
中文摘要	As the primary facility for the manufacturing of integrated circuit(IC), and MEMS devices([1]), the lithographic equipment's improvement is restricted by the projection objective which can decide the capacity of the image transmission of the facility and make the facility be capable of reaching the higher precision or beyond. On the basis of the function, increasing the numeric aperture is coupled with the raising of resolution of the projection objective. In this paper, a design of a projection objective with high numeric aperture and large view field for I-line lithography is proposed. Owning a dual-telecentric structure this optical system owns an angular magnification of -1.25, an effective image field of 90x90mm and an image numeric aperture of 0.2. Two aspheric surfaces are adopted in this projection objective to enhance the quality of imaging that will insure the field curvature lower than a half of the DOF, restrict the distortion lower than +/-sigma/5 and make the MTF approximate the diffraction limits.
英文摘要	As the primary facility for the manufacturing of integrated circuit(IC), and MEMS devices([1]), the lithographic equipment's improvement is restricted by the projection objective which can decide the capacity of the image transmission of the facility and make the facility be capable of reaching the higher precision or beyond. On the basis of the function, increasing the numeric aperture is coupled with the raising of resolution of the projection objective. In this paper, a design of a projection objective with high numeric aperture and large view field for I-line lithography is proposed. Owning a dual-telecentric structure this optical system owns an angular magnification of -1.25, an effective image field of 90x90mm and an image numeric aperture of 0.2. Two aspheric surfaces are adopted in this projection objective to enhance the quality of imaging that will insure the field curvature lower than a half of the DOF, restrict the distortion lower than +/-sigma/5 and make the MTF approximate the diffraction limits.
学科主题	High numeric aperture; large view field; aspheric surface; dual-telecentric structure
语种	英语
ISSN号	0277-786X
内容类型	会议论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7662]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.[Liu, Junbo 2.Hu, Song 3.Gao, Hongtao 4.Zhao, Lixin 5.Zhu, Xianchang] Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China
推荐引用方式 GB/T 7714	Liu, Junbo,Hu, Song,Gao, Hongtao,et al. Design of a projection objective with high numeric aperture and large view field[C]. 见:Proceedings of SPIE: 7TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: DESIGN, MANUFACTURING, AND TESTING OF MICRO- AND NANO-OPTICAL DEVICES AND SYSTEMS. 2014.

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