QQ客服 官方微博 反馈留言

	Effects of grating marks parameters on lithography alignment precision
	Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2
	2012
会议名称	Proceedings of SPIE: Nanophotonics and Micro/Nano Optics
会议日期	2012
卷号	8564
页码	85641K
通讯作者	Zhu, J. (zsyioe@163.com)
中文摘要	Effects of grating marks parameters on alignment precision and scope are investigated in this paper. In the lithography alignment method based on moire´ fringe, gratings are especially used as alignment marks. However, the rational design of grating marks for this approach to realize high-precision alignment is of great importance. In order to improve the feasibility of the alignment method, effects of several physical parameters of grating marks on alignment precision are analyzed by numerical calculation. The results imply that qualities of grating marks, such as size of period and ratio between two gratings, have an important impact on alignment precision and scope. © 2012 SPIE.
英文摘要	Effects of grating marks parameters on alignment precision and scope are investigated in this paper. In the lithography alignment method based on moire´ fringe, gratings are especially used as alignment marks. However, the rational design of grating marks for this approach to realize high-precision alignment is of great importance. In order to improve the feasibility of the alignment method, effects of several physical parameters of grating marks on alignment precision are analyzed by numerical calculation. The results imply that qualities of grating marks, such as size of period and ratio between two gratings, have an important impact on alignment precision and scope. © 2012 SPIE.
收录类别	EI
语种	英语
ISSN号	0277786X
内容类型	会议论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7648]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan, 610209, China 2.University of Electronic Science and Technology of China, Chengdu, Sichuan, 610054, China 3.Graduate University, Chinese Academy of Sciences, Beijing 100039, China
推荐引用方式 GB/T 7714	Zhu, Jiangping,Hu, Song,Yu, Junsheng. Effects of grating marks parameters on lithography alignment precision[C]. 见:Proceedings of SPIE: Nanophotonics and Micro/Nano Optics. 2012.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。