Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt

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	Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt
	Wang, XB; Huang, W; Gong, Y; Jiang, F; Zheng, HY; Zhu, TJ; Long, DW; Li, QN
刊名	ELECTROCHIMICA ACTA
	2016
卷号	196 期号:-页码:286—293
关键词	KCL EUTECTIC MELTS MOLTEN LICL-KCL LIF-NAF-KF THORIUM FLUORIDE NUCLEAR-FUEL REDUCTION SALT ALLOYS THO2 IONS
ISSN号	0013-4686
通讯作者	Long, DW ; Li, QN (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China. ; Long, DW ; Li, QN (reprint author), Chinese Acad Sci, Key Lab Nucl Radiat & Nucl Energy Technol, Shanghai 201800, Peoples R China. ; Long, DW ; Li, QN (reprint author), Chinese Acad Sci, Ctr Excellence TMSR Energy Syst, Shanghai 201800, Peoples R China.
英文摘要	The electrochemical behavior of Th(IV) ion on molybdenum (Mo) electrode was studied by cyclic voltammetry (CV) and square wave voltammetry (SWV) technologies at 773 K in ThF4-LiCl-KCl melt. The reduction of Th(IV) to metal Th at -1.67 V (vs. Ag/AgCl) is a four-electron exchange process, which is quasi-reversible and diffusion-controlled. The diffusion coefficient (D) and activation energy of diffusion process for Th(IV) were determined to be 3.77 x 10 (5) cm(2) s (1) and 59.2 kJ mol (1). The pulse potential electrolysis of ThF4-LiCl-KCl melt revealed that 86.8% of Th(IV) can be separated from the melt based on the inductively coupled plasma atomic emission spectrometer (ICP-AES) results. (C) 2016 Elsevier Ltd. All rights reserved.
收录类别	SCI
语种	英语
WOS记录号	WOS:000372877400032
内容类型	期刊论文
源URL	[http://ir.sinap.ac.cn/handle/331007/25706]
专题	上海应用物理研究所_中科院上海应用物理研究所2011-2017年
推荐引用方式 GB/T 7714	Wang, XB,Huang, W,Gong, Y,et al. Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt[J]. ELECTROCHIMICA ACTA,2016,196(-):286—293.
APA	Wang, XB.,Huang, W.,Gong, Y.,Jiang, F.,Zheng, HY.,...&Li, QN.(2016).Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt.ELECTROCHIMICA ACTA,196(-),286—293.
MLA	Wang, XB,et al."Electrochemical behavior of Th(IV) and its electrodeposition from ThF4-LiCl-KCl melt".ELECTROCHIMICA ACTA 196.-(2016):286—293.