Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微细加工光学技术国家重点实验室（开放室）

	Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer
	Ren, Guowei ; Wang, Changtao ; Yi, Guangwei ; Tao, Xing ; Luo, Xiangang
刊名	PLASMONICS
	2013
卷号	8 期号:2 页码:1065-1072
ISSN号	1557-1955
通讯作者	Luo, XG (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, POB 350, Chengdu 610209, Peoples R China.
中文摘要	Unlike the case in magnification mode, it is found that hyperlens employed in demagnification and lithography manner encounters great degradation of imaging quality especially for high-resolution image features. This problem mainly arises from the transversal magnetic polarization feature of light which delivers reduced contrast of electronic components intensity profile at the imaging region. Hyperlens with plasmonic reflector layer is designed for subwavelength demagnification imaging and photolithography. Analytical equations and numerical simulations show amplification of reflected evanescent waves in photoresist sandwiched by hyperlens and plasmonic reflectors in cylindrical geometry. The image quality features including resolution, contrast, and intensity can be improved significantly. Also presented are the dependence and influence of geometry parameters on imaging quality. Numerical demonstrations are given with about 15 nm half-pitch resolution imaging at illuminating wavelength of 365 nm.
英文摘要	Unlike the case in magnification mode, it is found that hyperlens employed in demagnification and lithography manner encounters great degradation of imaging quality especially for high-resolution image features. This problem mainly arises from the transversal magnetic polarization feature of light which delivers reduced contrast of electronic components intensity profile at the imaging region. Hyperlens with plasmonic reflector layer is designed for subwavelength demagnification imaging and photolithography. Analytical equations and numerical simulations show amplification of reflected evanescent waves in photoresist sandwiched by hyperlens and plasmonic reflectors in cylindrical geometry. The image quality features including resolution, contrast, and intensity can be improved significantly. Also presented are the dependence and influence of geometry parameters on imaging quality. Numerical demonstrations are given with about 15 nm half-pitch resolution imaging at illuminating wavelength of 365 nm.
学科主题	Multilayers; Subwavelength structures; Metamaterials; Plasmonics
收录类别	SCI
语种	英语
WOS记录号	WOS:000320445700118
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/6830]
专题	光电技术研究所_微细加工光学技术国家重点实验室（开放室）
作者单位	1.[Ren, Guowei 2.Wang, Changtao 3.Yi, Guangwei 4.Tao, Xing 5.Luo, Xiangang] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China
推荐引用方式 GB/T 7714	Ren, Guowei,Wang, Changtao,Yi, Guangwei,et al. Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer[J]. PLASMONICS,2013,8(2):1065-1072.
APA	Ren, Guowei,Wang, Changtao,Yi, Guangwei,Tao, Xing,&Luo, Xiangang.(2013).Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer.PLASMONICS,8(2),1065-1072.
MLA	Ren, Guowei,et al."Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer".PLASMONICS 8.2(2013):1065-1072.