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	Single closed fringe pattern phase demodulation in alignment of nanolithography
	Xu, Feng1,2; Hu, Song1; Yang, Yong1; Li, Jinlong1,2; Li, Lanlan1,2
刊名	Optik
	2013
卷号	124期号:9页码:818-823
ISSN号	00304026
通讯作者	Xu, F. (casxufeng@gmail.com)
中文摘要	The single closed fringe pattern that occurs in two superposed grating marks applied in the previously designed moire´ alignment scheme based on dual-grating for lithography is processed and analyzed using a frequency domain method based on two-dimensional (2-D) analytic wavelet transform (AWT) and 2-D wavelet ridge algorithm. The sign ambiguities, which always occur in the process of single closed fringe pattern analysis, are removed through the discontinuities of the angle in the 2-D wavelet ridge. Theoretical analysis regarding application of 2-D AWT and 2-D wavelet ridge to the interference fringe in alignment is performed. Verification of this process is carried out through numerical simulation and experiment. Results indicate that the background and noise in the fringes can be filtered effectively through our method, and the phase information can be obtained successfully. © 2012 Elsevier GmbH.
英文摘要	The single closed fringe pattern that occurs in two superposed grating marks applied in the previously designed moire´ alignment scheme based on dual-grating for lithography is processed and analyzed using a frequency domain method based on two-dimensional (2-D) analytic wavelet transform (AWT) and 2-D wavelet ridge algorithm. The sign ambiguities, which always occur in the process of single closed fringe pattern analysis, are removed through the discontinuities of the angle in the 2-D wavelet ridge. Theoretical analysis regarding application of 2-D AWT and 2-D wavelet ridge to the interference fringe in alignment is performed. Verification of this process is carried out through numerical simulation and experiment. Results indicate that the background and noise in the fringes can be filtered effectively through our method, and the phase information can be obtained successfully. © 2012 Elsevier GmbH.
学科主题	Alignment - Demodulation - Frequency domain analysis - Information filtering - Optical variables measurement
收录类别	SCI ; EI
语种	英语
WOS记录号	WOS:000318056600010
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7284]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.Institute Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 2.Graduate University of Chinese Academy of Sciences, Beijing 100039, China
推荐引用方式 GB/T 7714	Xu, Feng,Hu, Song,Yang, Yong,et al. Single closed fringe pattern phase demodulation in alignment of nanolithography[J]. Optik,2013,124(9):818-823.
APA	Xu, Feng,Hu, Song,Yang, Yong,Li, Jinlong,&Li, Lanlan.(2013).Single closed fringe pattern phase demodulation in alignment of nanolithography.Optik,124(9),818-823.
MLA	Xu, Feng,et al."Single closed fringe pattern phase demodulation in alignment of nanolithography".Optik 124.9(2013):818-823.

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