Determination of optical constants in DUV/VUV | |
Guo, Chun1,2; Kong, Mingdong1; Lin, Dawei1; Liu, Cunding1; Gao, Weidong1; Li, Bincheng1 | |
刊名 | Chinese Optics Letters
![]() |
2013 | |
卷号 | 11期号:SUPPL.1页码:S10607 |
ISSN号 | 16717694 |
通讯作者 | Li, B. (bcli@ioe.ac.cn) |
中文摘要 | An approach for determining the optical constants of the weakly absorbing substrate is developed and applied to obtain the parameters of CaF2 and fused silica substrates in deep ultraviolet (DUV) and vacuum ultraviolet (VUV) range. A method for extracting the optical constants of thin films deposited on strongly absorbing substrate, which is based on the reflectance spectra measured at different angles of incidence, is also presented. The optical constants are determined by fitting the measured spectra to the theoretical models. The proposed method is applied to determine the refractive index and extinction coefficient (n, k) of MgF2 film deposited on silicon substrate by electron beam evaporation with substrate temperature 300°C and deposition rate 0.2 nm/s. The determined n, k values at 193 nm are 1.433 and 9.1×10-4, respectively. © 2013 Chinese Optics Letters. |
英文摘要 | An approach for determining the optical constants of the weakly absorbing substrate is developed and applied to obtain the parameters of CaF2 and fused silica substrates in deep ultraviolet (DUV) and vacuum ultraviolet (VUV) range. A method for extracting the optical constants of thin films deposited on strongly absorbing substrate, which is based on the reflectance spectra measured at different angles of incidence, is also presented. The optical constants are determined by fitting the measured spectra to the theoretical models. The proposed method is applied to determine the refractive index and extinction coefficient (n, k) of MgF2 film deposited on silicon substrate by electron beam evaporation with substrate temperature 300°C and deposition rate 0.2 nm/s. The determined n, k values at 193 nm are 1.433 and 9.1×10-4, respectively. © 2013 Chinese Optics Letters. |
学科主题 | Optical constants - Refractive index |
收录类别 | SCI ; EI |
语种 | 英语 |
WOS记录号 | WOS:000209349900046 |
内容类型 | 期刊论文 |
源URL | [http://ir.ioe.ac.cn/handle/181551/6624] ![]() |
专题 | 光电技术研究所_薄膜光学技术研究室(十一室) |
作者单位 | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 2.University of Chinese Academy of Sciences, Beijing 100039, China |
推荐引用方式 GB/T 7714 | Guo, Chun,Kong, Mingdong,Lin, Dawei,et al. Determination of optical constants in DUV/VUV[J]. Chinese Optics Letters,2013,11(SUPPL.1):S10607. |
APA | Guo, Chun,Kong, Mingdong,Lin, Dawei,Liu, Cunding,Gao, Weidong,&Li, Bincheng.(2013).Determination of optical constants in DUV/VUV.Chinese Optics Letters,11(SUPPL.1),S10607. |
MLA | Guo, Chun,et al."Determination of optical constants in DUV/VUV".Chinese Optics Letters 11.SUPPL.1(2013):S10607. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论