| Even aberration measurement of lithographic projection system based on optimized phase-shifting marks | |
| Qiongyan Yuan ; Xiangzhao Wang ; Zicheng Qiu ; Fan Wang ; Mingying Ma | |
| 刊名 | microelectronic engineering
 |
| 2009 | |
| 卷号 | 86期号:1 |
| 合作状况 | 其它 |
| 学科主题 | 光学 |
| 收录类别 | 其他 |
| 语种 | 中文 |
| 公开日期 | 2010-04-26 |
| 内容类型 | 期刊论文 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/6586]  |
| 专题 | 上海光学精密机械研究所_信息光学开放实验室 |
| 推荐引用方式 GB/T 7714 | Qiongyan Yuan,Xiangzhao Wang,Zicheng Qiu,et al. Even aberration measurement of lithographic projection system based on optimized phase-shifting marks[J]. microelectronic engineering,2009,86(1). |
| APA | Qiongyan Yuan,Xiangzhao Wang,Zicheng Qiu,Fan Wang,&Mingying Ma.(2009).Even aberration measurement of lithographic projection system based on optimized phase-shifting marks.microelectronic engineering,86(1). |
| MLA | Qiongyan Yuan,et al."Even aberration measurement of lithographic projection system based on optimized phase-shifting marks".microelectronic engineering 86.1(2009). |
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