The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering

	The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering
	Zhang, H; Liu, YS; Liu, WH; Wang, BY; Wei, L; Wang BY(王宝义); Wei L(魏龙)
刊名	ACTA PHYSICA SINICA
	2007
卷号	56 期号:12 页码:7255-7261
关键词	vanadium oxide magnetron sputtering phase change films X-ray photoelectron spectrum
通讯作者	[Zhang Hui ; Liu Ying-Shu ; Liu Wen-Hai] Univ Sci & Technol Beijing, Sch Mech Engn, Beijing 100083, Peoples R China ; [Zhang Hui ; Wang Bao-Yi ; Wei Long] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China
英文摘要	The properties of vanadium pentoxide (V2O5) films deposited by reactive DC sputtering from vanadium target were investigated. In particular, the chemical state of elements and microstructure of films were analyzed by X-ray photoelectron spectroscopy, X-ray diffraction and field-emission scanning electron microscopy. The percentage of oxygen in the sputtering chamber affects the chemical state of vanadium in the film. Higher oxygen partial pressure makes to vanadium to be oxidized from V4+ to V5+, and the grain size increased with grain a shape of needles, but the content of oxygen with high binding energy decreases. Higher temperature of substrates causes the grains to grow from needles to large flakes lying parallel to the substrate, and vanadium is oxidized to the stable high binding energy states.
学科主题	Physics
类目[WOS]	Physics, Multidisciplinary
研究领域[WOS]	Physics
原文出处	SCI
语种	英语
WOS记录号	WOS:000252018900074
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/240110]
专题	高能物理研究所_多学科研究中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Zhang, H,Liu, YS,Liu, WH,et al. The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering[J]. ACTA PHYSICA SINICA,2007,56(12):7255-7261.
APA	Zhang, H.,Liu, YS.,Liu, WH.,Wang, BY.,Wei, L.,...&魏龙.(2007).The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering.ACTA PHYSICA SINICA,56(12),7255-7261.
MLA	Zhang, H,et al."The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering".ACTA PHYSICA SINICA 56.12(2007):7255-7261.