Investigations of helium incorporated into a film deposited by magnetron sputtering

	Investigations of helium incorporated into a film deposited by magnetron sputtering
	Liu, CZ; Shi, LQ; Zhou, ZY; Hao, XP; Wang, BY; Liu, S; Wang, LB; Hao XP(郝小鹏); Wang BY(王宝义)
刊名	JOURNAL OF PHYSICS D-APPLIED PHYSICS
	2007
卷号	40 期号:7 页码:2150-2156
通讯作者	Fudan Univ, Inst Modern Phys, Shanghai, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Beijing, Peoples R China ; Chinese Acad Sci, Inst Phys Met, Shenyang, Peoples R China
英文摘要	Helium-containing titanium film was prepared by magnetron sputtering in a gas mixture of helium and argon. This method distinctly differs from traditional helium introduction into metals. A high concentration of helium up to 45 at.% and a uniform distribution in the bulk were shown by ion beam analysis. The process of helium incorporation is considered in which the helium particles are energetically backscattered from the target, fly through the glow discharge zone and are consequently embedded into the growing film. It is virtually a continuous sub-threshold-energy implantation during film deposition based on the plasma technique. The limited partial pressure of argon is to maintain the discharge and sputter the titanium target. The helium content incorporated can be controlled conveniently by adjusting the pressure of the working gases. X-ray diffraction, transmission electron microscopy, Doppler broadening of positron beam analysis and thermal helium desorption spectroscopy revealed the microstructure of titanium films, the state of helium bubbles, the defect characteristic related to helium and thermal release behaviour of helium from the titanium film.
学科主题	Physics
类目[WOS]	Physics, Applied
研究领域[WOS]	Physics
原文出处	SCI
语种	英语
WOS记录号	WOS:000245301300044
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/239668]
专题	高能物理研究所_多学科研究中心高能物理研究所_粒子天体物理中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Liu, CZ,Shi, LQ,Zhou, ZY,et al. Investigations of helium incorporated into a film deposited by magnetron sputtering[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2007,40(7):2150-2156.
APA	Liu, CZ.,Shi, LQ.,Zhou, ZY.,Hao, XP.,Wang, BY.,...&王宝义.(2007).Investigations of helium incorporated into a film deposited by magnetron sputtering.JOURNAL OF PHYSICS D-APPLIED PHYSICS,40(7),2150-2156.
MLA	Liu, CZ,et al."Investigations of helium incorporated into a film deposited by magnetron sputtering".JOURNAL OF PHYSICS D-APPLIED PHYSICS 40.7(2007):2150-2156.