Microstructures of epitaxial thin films of YBa2Cu3O7-delta deposited on silicon wafers | |
Mai, ZH; Chen, XM; Wang, Y; Gao, J; Li, TK; Wong, HY; Zheng, WL; Jia, QJ; Zheng WL(郑文莉); Jia QJ(贾全杰) | |
刊名 | SUPERCONDUCTOR SCIENCE & TECHNOLOGY |
2003 | |
卷号 | 16期号:5页码:590-594 |
通讯作者 | Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China ; Chinese Acad Sci, Ctr Condensed Matter Phys, Beijing 100080, Peoples R China ; Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Beijing Synchrotron Radiat Facil, Beijing 100039, Peoples R China |
英文摘要 | The microstructures of YBa2Cu3O7-delta (YBCO) thin films deposited on Si(001) wafers with an yttrium-stabilized ZrO2 (YSZ) single buffer or/and an Eu2CuO4(ECO)/YSZ double buffer layer were investigated by using high-resolution x-ray diffraction, small angle reflection and scanning electron microscopy (SEM), respectively. The results showed that the YBCO films were well oriented in the [001] direction perpendicular to the substrate surface. A thin intermediate layer of BaZrO3 was observed at the interface of YBCO/YSZ for samples with a YSZ single buffer. The composition of the YBCO film was also diverse from the 1-2-3 compound. In contrast, a well-defined interface was formed for samples with an ECO/YSZ double buffer. The film surface was more smooth and stable. The composition of the YBCO films was also found to approach that of the 1-2-3 compound. The results obtained indicate that highly epitaxial YBCO thin films could be successfully grown on Si wafers with a double buffer of ECO/YSZ. demonstrating advantages of such a double buffer structure. |
学科主题 | Physics |
类目[WOS] | Physics, Applied ; Physics, Condensed Matter |
研究领域[WOS] | Physics |
原文出处 | SCI |
语种 | 英语 |
WOS记录号 | WOS:000183131100011 |
内容类型 | 期刊论文 |
源URL | [http://ir.ihep.ac.cn/handle/311005/238047] |
专题 | 高能物理研究所_多学科研究中心 中国科学院高能物理研究所_人力资源处 |
作者单位 | 中国科学院高能物理研究所 |
推荐引用方式 GB/T 7714 | Mai, ZH,Chen, XM,Wang, Y,et al. Microstructures of epitaxial thin films of YBa2Cu3O7-delta deposited on silicon wafers[J]. SUPERCONDUCTOR SCIENCE & TECHNOLOGY,2003,16(5):590-594. |
APA | Mai, ZH.,Chen, XM.,Wang, Y.,Gao, J.,Li, TK.,...&贾全杰.(2003).Microstructures of epitaxial thin films of YBa2Cu3O7-delta deposited on silicon wafers.SUPERCONDUCTOR SCIENCE & TECHNOLOGY,16(5),590-594. |
MLA | Mai, ZH,et al."Microstructures of epitaxial thin films of YBa2Cu3O7-delta deposited on silicon wafers".SUPERCONDUCTOR SCIENCE & TECHNOLOGY 16.5(2003):590-594. |
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