Phase depth profile in Ni-Ti shape memory alloy films made up from sputter-deposited Ni/Ti multilayers | |
Wei XJ(魏向军); Xu Q(徐清); Jia QJ(贾全杰); Wang HH(王焕华); Wei, XJ; Xu, Q; Jia, QJ; Wang, HH | |
刊名 | HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION |
2005 | |
卷号 | 29页码:#REF! |
关键词 | phase depth profile shape memory Ni-Ti multilayers |
其他题名 | 周期性多层膜合金化制取的Ni-Ti形状记忆薄膜的相深度分布 |
通讯作者 | Wei, XJ (reprint author), Lanzhou Univ, Inst Phys Sci & Technol, Lanzhou 730000, Peoples R China. |
英文摘要 | Phase depth profile in NiTi shape memory alloy films made up from sputter-deposited Ni/Ti multilayers is studied by Grazing-Incidence X-Ray Diffraction. Phase depth profile is not uniform in NiTi films.. Both samples show there is a multiphase mixture region of Ti3Ni4 precipitates, martensite,and a little of austenite near the free surface and a uniform Martensite phase near the substrate. Diffusion. and reaction take place between film and substrate. Different periodical thickness will affect the phase depth profile in the after-annealing films. |
学科主题 | Physics |
类目[WOS] | Physics, Nuclear ; Physics, Particles & Fields |
收录类别 | SCI |
WOS记录号 | WOS:000234206900011 |
公开日期 | 2016-05-03 |
内容类型 | 期刊论文 |
源URL | [http://ir.ihep.ac.cn/handle/311005/225682] |
专题 | 高能物理研究所_多学科研究中心 |
推荐引用方式 GB/T 7714 | Wei XJ,Xu Q,Jia QJ,et al. Phase depth profile in Ni-Ti shape memory alloy films made up from sputter-deposited Ni/Ti multilayers[J]. HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,2005,29:#REF!. |
APA | 魏向军.,徐清.,贾全杰.,王焕华.,Wei, XJ.,...&Wang, HH.(2005).Phase depth profile in Ni-Ti shape memory alloy films made up from sputter-deposited Ni/Ti multilayers.HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,29,#REF!. |
MLA | 魏向军,et al."Phase depth profile in Ni-Ti shape memory alloy films made up from sputter-deposited Ni/Ti multilayers".HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION 29(2005):#REF!. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论