Investigation of diffusion length distribution on polycrystalline silicon wafers via photoluminescence methods

	Investigation of diffusion length distribution on polycrystalline silicon wafers via photoluminescence methods
	Shishu Lou ; Huishi Zhu ; Shaoxu Hu ; Chunhua Zhao ; Peide Han
刊名	scientific reports
	2015
卷号	5 页码:14084
学科主题	光电子学
收录类别	SCI
语种	英语
公开日期	2016-03-22
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/26689]
专题	半导体研究所_光电子研究发展中心
推荐引用方式 GB/T 7714	Shishu Lou,Huishi Zhu,Shaoxu Hu,et al. Investigation of diffusion length distribution on polycrystalline silicon wafers via photoluminescence methods[J]. scientific reports,2015,5:14084.
APA	Shishu Lou,Huishi Zhu,Shaoxu Hu,Chunhua Zhao,&Peide Han.(2015).Investigation of diffusion length distribution on polycrystalline silicon wafers via photoluminescence methods.scientific reports,5,14084.
MLA	Shishu Lou,et al."Investigation of diffusion length distribution on polycrystalline silicon wafers via photoluminescence methods".scientific reports 5(2015):14084.