Formation and characterization of Ni/Al Ohmic contact on n+-type GeSn

	Formation and characterization of Ni/Al Ohmic contact on n+-type GeSn
	Xu Zhang ; Dongliang Zhang ; Jun Zheng ; Zhi Liu ; Chao He ; Chunlai Xue ; Guangze Zhang ; Chuanbo Li ; Buwen Cheng ; Qiming Wang
刊名	solid-state electronics
	2015
卷号	114 页码:178–181
学科主题	光电子学
收录类别	SCI
语种	英语
公开日期	2016-03-22
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/26657]
专题	半导体研究所_光电子研究发展中心
推荐引用方式 GB/T 7714	Xu Zhang,Dongliang Zhang,Jun Zheng,et al. Formation and characterization of Ni/Al Ohmic contact on n+-type GeSn[J]. solid-state electronics,2015,114:178–181.
APA	Xu Zhang.,Dongliang Zhang.,Jun Zheng.,Zhi Liu.,Chao He.,...&Qiming Wang.(2015).Formation and characterization of Ni/Al Ohmic contact on n+-type GeSn.solid-state electronics,114,178–181.
MLA	Xu Zhang,et al."Formation and characterization of Ni/Al Ohmic contact on n+-type GeSn".solid-state electronics 114(2015):178–181.