808 nm high-power laser grown by MBE through the control of Be diffusion and use of superlattice
Zhu DH ; Wang ZG ; Liang JB ; Xu B ; Zhu ZP ; Zhang J ; Gong Q ; Li SY
刊名journal of crystal growth
1997
卷号175期号:0页码:1004-1008
关键词high-power semiconductor laser MBE quantum well MOLECULAR-BEAM EPITAXY QUANTUM-WELL LASERS BERYLLIUM DIODES MIGRATION OPERATION MIRRORS
ISSN号0022-0248
通讯作者zhu dh chinese acad sciinst semicondlab semicond mat scipob 912beijing 100083peoples r china.
中文摘要808 nm high-power laser diodes are gown by mbe. in the laser structure, the combination of si-doped grin (graded-index) region adjacent to n-algaas cladding layer with reduced be doping concentration near the active region has been used to diminish be diffusion and oxygen incorporation. as compared with the laser structure which has undoped grin region and uniform doping concentration for si and be, respectively, in the cladding layers, the slope efficiency has increased by about 8%. typical threshold current density of 300 a/cm(2) and the minimum threshold current density of 220 a/cm(2) for lasers with 500 mu m cavity length are obtained. a high slope efficiency of 1.3 w/a for coated lasers with 1000 mu m cavity length is also demonstrated, recorded cw output power at room temperature has reached 2.3 w.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-11-17
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/15149]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Zhu DH,Wang ZG,Liang JB,et al. 808 nm high-power laser grown by MBE through the control of Be diffusion and use of superlattice[J]. journal of crystal growth,1997,175(0):1004-1008.
APA Zhu DH.,Wang ZG.,Liang JB.,Xu B.,Zhu ZP.,...&Li SY.(1997).808 nm high-power laser grown by MBE through the control of Be diffusion and use of superlattice.journal of crystal growth,175(0),1004-1008.
MLA Zhu DH,et al."808 nm high-power laser grown by MBE through the control of Be diffusion and use of superlattice".journal of crystal growth 175.0(1997):1004-1008.
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