Application of Combined α-RBS and PIXE Analysis Technology

	Application of Combined α-RBS and PIXE Analysis Technology
	Xia CH(夏琮璜); Shen DY(沈定予); Li SZ(李硕中); Liu SJ(刘士杰); Wang J(王江); Hu CH(胡朝晖)
刊名	Rare Metals
	1992
期号	2 页码:98-101
关键词	RBS PIXE Channeling mode Ion Implantation GaAs
英文摘要	An analysis technique combining RBS with PIXE technology by x-particles incident beam was constructedand applied to analyse light impurities in heavier substrates.It can run in measuring Rutherford backscatteringand X-ray spectra in random and channeling mode,simultaneously.Being used to analyse...
公开日期	2016-02-25
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/221219]
专题	高能物理研究所_多学科研究中心
推荐引用方式 GB/T 7714	Xia CH,Shen DY,Li SZ,et al. Application of Combined α-RBS and PIXE Analysis Technology[J]. Rare Metals,1992(2):98-101.
APA	夏琮璜,沈定予,李硕中,刘士杰,王江,&胡朝晖.(1992).Application of Combined α-RBS and PIXE Analysis Technology.Rare Metals(2),98-101.
MLA	夏琮璜,et al."Application of Combined α-RBS and PIXE Analysis Technology".Rare Metals .2(1992):98-101.