Rapid thermal annealing for α-Si/metal/semiconductor waveguide for active control of surface plasmon polaritons propagation | |
Hui Zhang; Yicen Li; Dao Hua Zhang; Ting Mei | |
2014-03 | |
会议名称 | OSA Topical Conference:The 4th Advances in Optoelectronics and Micro/nano-optics |
会议日期 | 2014-09 |
会议地点 | Xi’an, China |
通讯作者 | Ting Mei |
收录类别 | 非正式出版 |
会议主办者 | Xi'an Institute of Optics and Precision Mechanics, CAS; Northwestern Polytechnical University |
会议录出版地 | Xi’an, China |
语种 | 英语 |
内容类型 | 会议论文 |
源URL | [http://ir.opt.ac.cn/handle/181661/23075] ![]() |
专题 | 会议录_AOM 2014(OSA Topical Conference:The 4th Advances in Optoelectronics and Micro/nano-optics |
推荐引用方式 GB/T 7714 | Hui Zhang,Yicen Li,Dao Hua Zhang,et al. Rapid thermal annealing for α-Si/metal/semiconductor waveguide for active control of surface plasmon polaritons propagation[C]. 见:OSA Topical Conference:The 4th Advances in Optoelectronics and Micro/nano-optics. Xi’an, China. 2014-09. |
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