THE ADSORPTION OF O2 ON FESI SURFACES

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	THE ADSORPTION OF O2 ON FESI SURFACES
	HSU CC ; DING SA ; MA MS ; WU JX ; LIU XM ; JI MR
刊名	surface science
	1992
卷号	269 期号:0 页码:1022-1031
关键词	METAL-SILICIDES OXIDATION OXYGEN GROWTH TRACER EELS XPS
ISSN号	0039-6028
通讯作者	hsu cc chinese acad sci natl lab surface phys pob 603 beijing peoples r china
中文摘要	the initial adsorption stages and the interaction of oxygen on fesi surfaces have been studied as a function of exposure and annealing temperature using a variety of techniques including hreels, aes, leed, xps and ups. o2 was found to adsorb dissociatively on the fesi surfaces at room temperature. the whole adsorption process can be divided into four stages. heating promotes the oxidation of si, and a thin sio2 overlayer is formed on the surface when annealed at 450-degrees-c, while all feox species are reduced. models for adsorbed atomic o on the fesi(100) surface exposed to different oxygen exposures have been put forward to account for the observed experimental results.
学科主题	半导体材料
收录类别	SCI
语种	英语
公开日期	2010-11-15
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/14191]
专题	半导体研究所_中国科学院半导体研究所（2009年前）
推荐引用方式 GB/T 7714	HSU CC,DING SA,MA MS,et al. THE ADSORPTION OF O2 ON FESI SURFACES[J]. surface science,1992,269(0):1022-1031.
APA	HSU CC,DING SA,MA MS,WU JX,LIU XM,&JI MR.(1992).THE ADSORPTION OF O2 ON FESI SURFACES.surface science,269(0),1022-1031.
MLA	HSU CC,et al."THE ADSORPTION OF O2 ON FESI SURFACES".surface science 269.0(1992):1022-1031.