QQ客服 官方微博 反馈留言

题名	光刻投影物镜像质分析及补偿研究
作者	杨旺
学位类别	博士
答辩日期	2015-05
授予单位	中国科学院大学
导师	黄玮
关键词	光学设计 光刻投影物镜 波像差 畸变 杂散光
其他题名	Research on the Analysis and Compensation Methods of the Image Quality in Lithographic Projection Lens
学位专业	光学
中文摘要	针对极大规模集成电路的发展，国内极大规模集成电路产业化需要，满足极大规模集成电路制造装备研发技术需求，开展了面向高数值孔径工作波长193nm光刻投影物镜像质的分析方法与补偿方法研究。 针对光刻投影物镜开展以下主要研究内容： 一、波像差分析与补偿：提出利用勒让德（Legendre）多项式表示泽尼克（Zernike）各项波像差随视场的变化，从而建立了波像差与视场之间的关系，为波像差分析与补偿研究提供了一种方法。研究了高数值孔径光刻投影物镜波像差与成像位置关系，推导出了波像差与成像位置转换系数，提高了通过波像差转换成像位置的精度。针对光刻投影物镜工作环境（如温度、压强、波长、振动等），研究了光刻投影物镜多种工作环境的特点，分析了多种环境因素对像质影响规律并制定了有效的像质补偿措施，利用环境因素对像质影响规律，通过对各别环境参数的控制实现像质补偿。 二、畸变分析与补偿：提出将畸变在笛卡尔坐标下正交分解和在视场范围内Legendre多项式正交分解，从而建立了畸变与视场之间的关系，构建了具有完备正交的畸变基底函数，为畸变分析与补偿研究提供了一种方法。研究了远心度对畸变的影响，并提出应用曲面光阑对光刻投影物镜远心度进行控制，减小离焦对畸变的影响。研究了掩模面安装误差对畸变的影响，推导了掩模面安装误差引入的畸变类型，并分析了彗差在典型工况下引入的畸变。 三、杂散光分析与控制：研究了光学表面中频误差等对杂散光的影响规律，提出使用功率谱密度函数描述光学元件表面中频误差，通过该描述方法进行杂散光分析，利用等效光瞳空间频率对光学元件表面中频误差进行公差分析。同时，分析了数值孔径一致性，提出使用副光阑提高数值孔径一致性的方法。 本文对光刻投影物镜的核心指标进行了分析方法研究及补偿方法研究，像质分析方法可以用来评价光刻投影物镜的指标满足度，补偿方法的应用可以降低多方面的公差要求，提高光刻投影物镜实现的可行性，降低光刻投影物镜研发成本。本文的研究成果为光刻投影物镜的相关工作人员提供了一定的参考。
英文摘要	For the development of very large scale integrated circuit and the domestic needs of the very scale integrated circuit industrialization, and in order to meet the demands for the development technology of manufacturing equipment to be used for the very large scale integrated circuit, the paper studies on the analysis and compensation methods for the high numerical aperture and wavelength 193nm lithographic projection lens. Aiming at the lithographic projection lens, the paper carries out the following main research contents: The first part is the analysis and compensation methods of the wavefront aberrations. The paper proposes to use Legendre polynomials to express the wavefront aberrations, so as to establish the relationships between the wavefront aberrations and the field. The expressions provide a method to study the analysis and compensation of the wavefront aberrations. The paper studies the relationships of the wavefront aberrations and the image position, and deduces the conversion coefficients of the wavefront aberrations and the image position. The conversion coefficients improve the conversion accuracy of the image position and the wavefront aberrations. The paper studies on the characteristics of the different working circumstances of the lithographic projection lens (such as temperature, pressure, vibration, wavelength, etc.). The paper analyzes the influence laws of the image quality in various kinds of circumstances and develops the compensation methods of the image quality. The favorable influence laws are used to compensate the image quality. The compensations are realized by controlling environmental factors. The second part is the analysis and compensation methods of the distortion. The paper proposes to express the distortion by means of decomposing orthogonally the distortion into the Cartesian coordinates and the Legendre polynomials, so as to establish the relationships between the distortion and the field. The twice distortion decompositions enrich the distortion types. The expressions provide a method for the study of the distortion analysis and compensation methods. The paper also studies on the telecentricity to effect on the distortion. And the spheric stop is used to control the telecentricity of the lithographic projection lens to reduce the distortion effected on by the defocus. The paper deduces the distortion of lithographic projection lens effected on by the alignment errors of the reticle in the optical lithography and analyzes the distortion caused by the coma in the typical conditions. The third part is the analysis and controlling methods of the flare. The paper researches the flare effected on by the optical mid-frequency surface errors. Power spectral density is used to describe the mid-spatial frequency surface errors and analyze the flare. The concept of equivalent spatial frequency pupil is used to analyze tolerance. At the same time, the paper analyzes the consistency of the numerical aperture, and puts forward to use the vice stop to improve the numerical aperture consistency. In the paper, the core requirements of the lithographic projection lens are researched, and the methods of the analysis and compensation are proposed. The analysis methods can be used to evaluate the satisfaction of the requirements of the lithographic projection lens. The application of the compensation methods can reduce the demands of the tolerance, improve the practicability of manufacturing the lithographic projection lens to achieve, and reduce the research and production costs of the lithographic projection lens. The results of the researches on the lithographic projection lens are the references to be provided for the people that they engage in the fields about researching on and producing and using the lithographic projection lens.
公开日期	2015-12-24
内容类型	学位论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/48939]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出
推荐引用方式 GB/T 7714	杨旺. 光刻投影物镜像质分析及补偿研究[D]. 中国科学院大学. 2015.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。