| 题名 | 极紫外光学薄膜元件表面抗污染保护层及相关技术研究 |
| 作者 | 王珣 |
| 学位类别 | 博士 |
| 答辩日期 | 2015-05 |
| 授予单位 | 中国科学院大学 |
| 导师 | 金春水 |
| 关键词 | 极紫外光刻 极紫外反射镜 表面碳沉积 表面保护层 非周期多层膜 |
| 其他题名 | Study on surface anti-contamination capping layer of the EUV optical elements and related technologies |
| 学位专业 | 光学 |
| 中文摘要 | 随着电子信息产业的快速发展，集成电路技术在计算机系统、自动化控制、精密机械、通信设备以及日常生活等诸多领域中扮演了极其重要的角色。光刻蚀技术正是高集成度电路制造的核心和关键。近几年，日益完善的193nm光刻系统及其物镜油浸技术，已经接近其理论极限。要突破22nm及以下技术节点，极紫外光刻技术已经显示出卓越的应用前景，商业化进程也趋于稳定、成熟。然而极紫外光学元件的表面污染，逐渐成为制约其商业应用的关键因素之一。为了保持光学元件的长使用周期和稳定的反射率，需要深入研究表面污染的机制并提出相应的解决方案。 本论文根据有机分子在极紫外光学薄膜元件表面的运动与反应机制，建立表面碳污染的理论模型，针对造成表面碳污染的主要影响因素（分子反应横截面积σ、结合能E、碳原子比重η、二次电子产额Y）进行了定量评估，并提出了适用于不同辐照环境下的光学表面碳污染抑制方法。根据理论模型模拟结果，选择TiO2作为极紫外投影物镜保护层材料。提出一种利用溅射反应“迟滞回线”高精度确定充氧量的工艺优化方法，制备出满足极紫外光刻反射镜的基本要求的抗污染多层膜样品。并考虑到表面污染的实际效果，提出一种对表面改性及厚度变化不敏感的非周期多层膜结构设计。模拟结果表明，当表面存在不可逆转的严重污染时，该结构较传统周期膜系具有更稳定的极紫外反射效率。适合于曝光环境恶劣、面型曲率较大的极紫外光刻聚光镜的制备。论文最后拓展极紫外反射镜保护层的相关功能。完成一种提高极紫外光谱纯度与抗表面污染能力的复合功能多层膜结构设计。模拟结果与相关实验表明，本方案可在不造成极紫外反射率过分损失的前提下，大幅度减少非工作波段光谱的反射。可降低极紫外光源系统的运行成本。 本文研究内容为极紫外薄膜保护层及相关光学元件的制备提供了理论与实验依据，对商业光刻机商业使用中出现的镜面污染状况进行合理预测和评估，并为其大规模市场化推广打下坚实的基础。 |
| 英文摘要 | With the development of electronic information industry, integrated circuit technology plays a very important role in computer systems, automation and control, precision machinery, communications equipment, and many other areas of daily life. And the lithographic technology is the core of integrated circuit manufacture. In recent years, increasingly sophisticated 193nm lithography systems and its objective lens immersion technology have been close to the limit of theoretical linewidth. To break through the 22nm and below technology nodes, EUVL technology has shown excellent application prospects and its commercialization process tends to be stable. However, the surface deposited contamination of EUV optical components has become one of the key restricting factors of their business applications. To maintain longer using cycle, it is necessary to achieve in-depth study of the mechanism of surface contamination and propose appropriate solutions. According to the mechanisms of surface motion and reaction of organic molecules on EUV multilayers, establishes a theoretical model of the surface of carbon contamination. Complete a quantitative assessment about key factors which causing surface carbon deposition (including molecular reaction cross-sectional area σ, binding energy E, the proportion of carbon atoms η, secondary electron yield Y). Some contamination inhibiting methods are proposed to different radiation environment. Based on the theoretical model simulation results, TiO2 is selected as capping layer material of EUV projection lens. By a optimization method of "hysteresis loop" of reactive magnetron sputtering, precisely determine the oxygen level. The film samples are prepared to meet the basic requirements of the EUVL mirrors. And taking into account the practical effect of surface contamination, a high performance EUV multilayer structure of insensitive to capping layer optical parameters is proposed. Simulation results show that, when the irreversible contamination appears on optical elements surface, the aperiodic structure has more stable EUV reflectivity than traditional periodic structure. This is especially suitable to prepare multilayer on large curvature surface type EUVL mirror in harsh exposure environment. Finally, expand the relate functions of the EUV capping layer. A complex functions EUV capping layer has been designed and prepared, which include the abilities of spectral purity and surface anti-contamination. The theoretical and experimental results show that this structure significantly reduces the reflectivity in non-working spectrum of the mirrors with no too much loss of EUV flux. Thus the operation cost of the extreme ultraviolet source system. The content of this paper provide theoretical and experimental basis for EUV capping layer and relate optical elements. The technology problems of commercial lithography systems are reasonable predicted and assessed. And make a solid foundation for its large-scale market promotion. |
| 公开日期 | 2015-12-24 |
| 内容类型 | 学位论文 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/48916]  |
| 专题 | 长春光学精密机械与物理研究所_中科院长春光机所知识产出 |
| 推荐引用方式 GB/T 7714 | 王珣. 极紫外光学薄膜元件表面抗污染保护层及相关技术研究[D]. 中国科学院大学. 2015. |
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