Characterization of magnetron sputtered Cr-B and Cr-B-C thin films for electrical contact applications

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	Characterization of magnetron sputtered Cr-B and Cr-B-C thin films for electrical contact applications
	Nedfors Nils 1; Primetzhofer, Daniel 2; Wang LP(王立平)3 ; Lu, Jun 4; Hultman, Lars 4; Jansson, Ulf 1
刊名	Surface and Coatings Technology
	2015
卷号	266 页码:167-176
关键词	Magnetron sputtering Chromium diboride Mechanical properties Tribological properties
ISSN号	0257-8972
通讯作者	Nedfors, Nils
英文摘要	We have deposited Cr–B and Cr–B–C thin films by co-sputtering from chromium boride and carbon targets. The binary Cr–B films consist of nanocrystalline and substoichiometric CrB_2 − x grains (B/Cr atomic ratio ≤ 1.5) with a (101)-texture, where B segregates to the grain boundaries forming a B-rich tissue phase. A hardness of 25 GPa is measured for these films. They have a low wear resistance, attributed to a (101)-texture and limited adhesion. As a consequence, wear debris in the CrB_2 − x wear track from delaminated film and steel-to-steel contact between the exposed substrate and the counter surface result in a high friction (0.52–0.78 against stainless steel) making the Cr–B films unsuitable as sliding electric contacts. Cr–B–C films, on the other hand, form a two phase amorphous structure at > 17 at.% C consisting of an amorphous Cr-rich phase containing both B and C and an amorphous matrix phase containing mainly B and C. The addition of C improves the adhesion and tribological properties and a coefficient of friction of 0.12 is obtained at 38 at.% C. The improved tribological properties are explained by the formation of the matrix phase, which acts as a solid lubricant forming a graphite-like tribofilm during ball-on-disc test. However, the formation of an amorphous structure is not beneficial for the electrical contact resistance, which increases from 0.5 Ω for the Cr–B film to 1.5 and 2.3 Ω for the Cr–B–C films containing 17 and 26 at.% C, respectively. Finally, the importance of a chemical analysis of the chromium boride sputtering target composition is discussed.
学科主题	材料科学与物理化学
收录类别	SCI
资助信息	Vinnova (Swedish Governmental Agency for Innovation Systems) through the VINN Excellence Centre FunMat. J. L. and U. J. also acknowledge the Swedish Foundation of Strategic Research through the Synergy Grant FUNCASE. U. J. acknowledges the Swedish Research Council (VR)
语种	英语
WOS记录号	WOS:000352664600022
内容类型	期刊论文
源URL	[http://210.77.64.217/handle/362003/18409]
专题	兰州化学物理研究所_固体润滑国家重点实验室
作者单位	1.Uppsala Univ, Dept Chem, Angstrom Lab, SE-75121 Uppsala, Sweden 2.Uppsala Univ, Dept Phys & Astron, Ion Phys, SE-75120 Uppsala, Sweden 3.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China 4.Linkoping Univ, Thin Film Phys Div, Dept Phys IFM, SE-58183 Linkoping, Sweden
推荐引用方式 GB/T 7714	Nedfors Nils,Primetzhofer, Daniel,Wang LP,et al. Characterization of magnetron sputtered Cr-B and Cr-B-C thin films for electrical contact applications[J]. Surface and Coatings Technology,2015,266:167-176.
APA	Nedfors Nils,Primetzhofer, Daniel,Wang LP,Lu, Jun,Hultman, Lars,&Jansson, Ulf.(2015).Characterization of magnetron sputtered Cr-B and Cr-B-C thin films for electrical contact applications.Surface and Coatings Technology,266,167-176.
MLA	Nedfors Nils,et al."Characterization of magnetron sputtered Cr-B and Cr-B-C thin films for electrical contact applications".Surface and Coatings Technology 266(2015):167-176.